Optical and semiconductor polishing pads
- Product Item : AT61007
- Category： Optical Lenses, Prisms, Wafers & Crystal Substrates
- Product description：
Polyurethane Polishing Pad
Product Introduction
The polyurethane polishing pad is a relatively durable abrasive cloth. Various abrasive cloths suitable for different needs can be made according to hardness, density, types of abrasive grains, and distribution of abrasive grain sizes. It is widely used in the polishing of integrated circuits, Si/SiC substrates, glass, optical lenses, and other substrates.
Non-woven Polishing Pad
Product Introduction
The non-woven polishing pad is a composite material obtained by impregnating non-woven fabric with resin. It is commonly used for coarse or medium polishing of silicon wafers, silicon carbide, sapphire, optical lenses, metals, and other materials.
Damping Cloth Polishing Pad
Product Introduction
It is a porous elastomeric material prepared from resin, foaming additives, pigments (optional), etc. It is used for precision grinding processes requiring high smoothness and low defect ivity. The most suitable products can be produced by matching different types of substrates according to customer needs. It is mainly used for the precision polishing of semiconductor substrates, hard disks, LCD glass substrates, sapphire, glass, and other materials.
