Microwave Plasma Chemical Vapor Deposition Equipment
- Product Item : AT61015
- Category： Semiconductor Coating & Deposition Equipment
- Product description：
equipment introduction
The Microwave Plasma Chemical Vapor Deposition (MPCVD) equipment is a high-configuration, multi-purpose, and highly stable medium-pressure microwave plasma (MPCVD) integrated processing device. It is suitable for applications in high-tech fields such as the chemical vapor deposition (CVD) of single-crystal and polycrystalline diamond films; material surface treatment and modification; and the growth of low-temperature oxides. The base platform available for diamond production is 3 inches in diameter, and its built-in 360° automatic rotation function enables more balanced diamond cultivation.
Equipment parameters
|
Item Name |
Model |
Configuration |
|
Fully Automatic Control System |
|
Automatic matching of gas pressure, temperature, and power |
|
Microwave Power Supply |
10KW |
Microwave control power supply and microwave generator |
|
Microwave Transmission System and Cavity |
|
Waveguide, circular cavity |
|
Mode Converter |
|
BJ26 |
|
Working base |
8CM diameter |
Water-cooled, electric lifting, 360-degree electric continuous rotation |
|
5-Channel Gas Flow Control System |
Select 5 channels |
500SCCM H2, 60sccm N2, 60sccm CH4, 60sccm O2, 60sccm Ar |
|
Vacuum and Gas Pipeline |
|
Gas mixer, bellows, etc. |
|
Direct-Connected Mechanical Pump |
|
6 liters/second |
|
Membrane meter |
|
Range 10Pa—99kPa |
|
Vacuum Gauge |
|
10^- 1 to 10^-9 Pa |
|
Substrate Infrared Temperature Measurement |
|
High-precision infrared thermometer with a temperature range of 150-1200°C |
|
Screen PLC |
14-inch LCD screen |
PLC |
